Generation of apodized X-ray illumination and its application to scanning and diffraction microscopy
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- 作者：Krishna P. Khakurel ; Takashi Kimura ; Hiroki Nakamori ; Takumi Goto ; Satoshi Matsuyama ; Tomoya Sasaki ; Masashi Takei ; Yoshiki Kohmura ; Tetsuya Ishikawa ; Kazuto Yamauchi and Yoshinori Nishino
- 关键词：X-ray deformable mirrors ; apodized X-ray illumination ; hard X-ray microscopy
- 刊名：Journal of Synchrotron Radiation
- 出版年：2017
- 出版时间：January 2017
- 年：2017
- 卷：24
- 期：1
- 页码：142-149
- 全文大小：1267K
- ISSN：1600-5775
文摘
X-ray science has greatly benefited from the progress in X-ray optics. Advances in the design and the manufacturing techniques of X-ray optics are key to the success of various microscopic and spectroscopic techniques practiced today. Here the generation of apodized X-ray illumination using a two-stage deformable Kirkpatrick–Baez mirror system is presented. Such apodized illumination is marked by the suppression of the side-lobe intensities of the focused beam. Thus generated apodized illumination was employed to improve the image quality in scanning X-ray fluorescence microscopy. Imaging of a non-isolated object by coherent X-ray diffractive imaging with apodized illumination in a non-scanning mode is also presented.