Fabrication of self-aligned multilevel nanostructures

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• 作者：Praveen Joseph^a ; ^c ; ^{praveenjoseph@utexas.edu} ; Shrawan Singhal^a ; Ovadia Abed^a ; S.V. Sreenivasan^a ; ^b
• 关键词：Nanoimprint lithography ; Multilevel patterning ; 3D patterning ; Self-aligned patterning ; Atomic layer deposition ; Multiple patterning ; Pattern transfer ; SADP
• 刊名：Microelectronic Engineering
• 出版年：2017
• 出版时间：5 February 2017
• 年：2017
• 卷：169
• 期：Complete
• 页码：49-61
• 全文大小：2341 K
• 卷排序：169

文摘

State of the art patterning techniques and their overlay limits are presented. Self-aligned multilevel nanoimprint templates are proposed as a solution to overcoming the overlay challenge. Fabrication processes for such templates using nanoimprint, ALD, and RIE are proposed. Four sub-100 nm multilevel shapes with precision alignment are demonstrated using just one patterning step. Specific applications are identified for the multilevel shapes.