Comparison of DC and AC arc thin film deposition techniques
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- 作者：Schuelke ; Thomas ; Witke ; Thomas ; Scheibe ; Hans-Joachim ; Siemroth ; Peter ; Schultrich ; Bernd ; et. al.
- 关键词：Diamond-like carbon ; Hard coatings ; Thin film deposition ; Vacuum arc technology
- 刊名：Surface and Coatings Technology
- 出版年：1999
- 出版时间：November, 1999
- 年：1999
- 卷：120-121
- 期：Complete
- 页码：226-232
- 全文大小：352 K
文摘
DC and AC vacuum arc evaporation comprise two techniques currently implemented for thin film deposition, each with specific technical aspects with regard to the discharge systems and their application fields. The DC arc discharge at several 10A up to 300A is a well-established PVD technique to deposit hard coatings for a variety of applications. Examples of applications benefiting from this technique are cutting and forming tools. The primary function of hard coatings in this instance is to reduce friction and wear, and the standard coating materials employed are TiN, CrN, TiCN and AlTiN. In today's manufacturing industries, machines are designed to be fully automated to simplify the coating process which contains several steps like heating, cleaning and deposition.