Argon plasma treatment of silicon nitride (SiN) for improved antireflection coating on c-Si solar cells

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• 作者：Hemanta Ghosh ; Suchismita Mitra ; Hiranmay Saha ; Swapan Kumar Datta ; Chandan Banerjee<sup> ; sup><sup>chandanbanerjee74@gmail.comsup>
• 关键词：Argon plasma treatment ; Silicon nitride ; Silicon oxynitride ; Double layer anti-reflection coating ; PECVD ; Solar cell
• 刊名：Materials Science and Engineering: B
• 出版年：2017
• 出版时间：January 2017
• 年：2017
• 卷：215
• 期：Complete
• 页码：29-36
• 全文大小：1890 K
• 卷排序：215

文摘

Antireflection properties of argon plasma treated silicon nitride layer and its effect on crystalline silicon solar cell. The reduction in reflection due to the formation of a silicon oxynitride/silicon nitride double layer. EQE reveals a relative increase of 2.72% in Jsc and 4.46% in conversion efficiency.