Influence of InN epilayers on structural, electrical and optical properties of NiO films grown by magnetron sputtering
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- 作者：Yang Zhaoa ; Guoguang Wua ; Jiyan Lengb ; ; Jia Liub ; Hang Yanga ; Wancheng Lia ; lwc9442@126.com" class="auth_mail" title="E-mail the corresponding author ; Baolin Zhanga ; Guotong Dua ; c
- 关键词：InN ; PAMBE ; NiO ; Magnetron sputtering
- 刊名：Vacuum
- 出版年：2016
- 出版时间：February 2016
- 年：2016
- 卷：124
- 期：Complete
- 页码：72-75
- 全文大小：1251 K
文摘
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The NiO films were prepared on GaN substrate by magnetron sputtering.
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The InN epilayer is critical to influence the physical properties of NiO films.
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The vacuum annealing could improve the crystalline qualities of NiO films.