文摘
A simple and efficient protocol for the deprotection of dithioacetal, 1,3-dithianes and 1,3-dithiolanes has been developed using H2O2¨CSOCl2 reagent system. In addition to the absence of overoxidation products for oxidation-prone substrates, high chemoselectivity, the low cost and availability of the reagents, simplicity of the method, short reaction times, and excellent yields can also be considered as strong points for this method.