Thermal stability of Al-Si_12at.% nano-alloys confined between AlN layers in a nanomultilayer configuration

详细信息    查看全文

• 作者：Joanna Lipecka^a ; ^b ; Jolanta Janczak-Rusch^a ; Malgorzata Lewandowska^b ; Mariusz Andrzejczuk^b ; Gunther Richter^c ; Lars P.H. Jeurgens^a ; ^{lars.jeurgens@empa.ch}
• 关键词：Metastable phases ; Heterogeneous nucleation of phase transformations ; Melting ; Multilayer thin films ; Melting point depression
• 刊名：Scripta Materialia
• 出版年：2017
• 出版时间：15 March 2017
• 年：2017
• 卷：130
• 期：Complete
• 页码：210-213
• 全文大小：854 K
• 卷排序：130

文摘

Nanomultilayers (NMLs) are envisaged for joining miniaturized and heat-sensitive components at ever-reduced temperatures. Investigation of the thermal stability of bulk-eutectic Al-Si12at.% nanolayers, confined between AlN barriers in a NML configuration, evidences the onset of phase separation of the supersaturated Al-Si solid solution into domains of pure Al and pure Si at around 200 °C. The phase-separated, but still nano-confined Al-Si nanolayers develop large in-plane compressive stresses upon further heating, which invoke extensive mass transport of both Si (by solid-state diffusion at T > 200 °C) and liquid Al (by heterogeneous contact melting at 300 < T < 400 °C) to the NML surface.