Low-energy electron irradiation induced top-surface nanocrystallization of amorphous carbon film

详细信息    查看全文

• 作者：Cheng Chen^a ; ^b ; Xue Fan^a ; ^{fanx@szu.edu.cn" class="auth_mail" title="E-mail the corresponding author} ; Dongfeng Diao^a ; ^{dfdiao@szu.edu.cn" class="auth_mail" title="E-mail the corresponding author}
• 关键词：Electron irradiation ; Amorphous carbon film ; Nanocrystallization ; Frictional property
• 刊名：Applied Surface Science
• 出版年：2016
• 出版时间：30 October 2016
• 年：2016
• 卷：384
• 期：Complete
• 页码：341-347
• 全文大小：3190 K

文摘

We report a low-energy electron irradiation method to nanocrystallize the top-surface of amorphous carbon film in electron cyclotron resonance plasma system. The nanostructure evolution of the carbon film as a function of electron irradiation density and time was examined by transmission electron microscope (TEM) and Raman spectroscopy. The results showed that the electron irradiation gave rise to the formation of sp² nanocrystallites in the film top-surface within 4 nm thickness. The formation of sp² nanocrystallite was ascribed to the inelastic electron scattering in the top-surface of carbon film. The frictional property of low-energy electron irradiated film was measured by a pin-on-disk tribometer. The sp² nanocrystallized top-surface induced a lower friction coefficient than that of the original pure amorphous film. This method enables a convenient nanocrystallization of amorphous surface.