Effect of laser power on orientation and microstructure of TiO₂ films prepared by laser chemical vapor deposition method

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• 作者：Dongyun Guo^a ; ^b ; ^{guodongyun@gmail.com} ; Akihiko Ito^b ; Takashi Goto^b ; Rong Tu^b ; Chuanbin Wang^a ; Qiang Shen^a ; Lianmeng Zhang^a
• 关键词：TiO2 film ; Laser chemical vapor deposition ; Laser power ; Orientation ; Microstructure
• 刊名：Materials Letters
• 出版年：2013
• 出版时间：15 February, 2013
• 年：2013
• 卷：93
• 期：Complete
• 页码：179-182
• 全文大小：701 K

文摘

The TiO₂ films were prepared on Pt/Ti/SiO₂/Si substrate by a laser chemical vapor deposition method. With increasing laser power (P_L) from 48 to 98 W, the deposition temperature (T_dep) monotonously increased from 849 to 929 K. At T_dep=849 K (P_L=48 W), the rutile TiO₂ film was prepared with strong (110) and (200) peaks. With increasing T_dep from 849 to 883 K (P_L=71 W), the intensity of (110) peak increased. The (110)-oriented TiO₂ films were obtained for T_dep beyond 903 K (P_L=81 W). All TiO₂ films showed faceted grains with the columnar cross-section. With increasing T_dep, the grain size increased and the column became wider. The high deposition rate (R_dep) ranged from 13.04 to 24.84 ¦Ìm h^?1.