Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3
详细信息 查看全文
- 作者：Yu-Chao Caoa ; c ; Lei Zhaoa ; Jin Luoa ; Ke Wanga ; wang-ke@mail.tsinghua.edu.cn" class="auth_mail" title="E-mail the corresponding author ; Bo-Ping Zhangc ; Hiroki Yokotab ; Yoshiyasu Itob ; Jing-Feng Lia ; jingfeng@mail.tsinghua.edu.cn" class="auth_mail" title="E-mail the corresponding author
- 关键词：Fluorocarbon plasma ; Etching ; Yttrium oxide ; Thermal spray ; Spark plasma sintering
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：15 March 2016
- 年：2016
- 卷：366
- 期：Complete
- 页码：304-309
- 全文大小：3168 K
文摘
- •
The etching behavior of Y2O3 coating was compared with that of Al2O3 coating.
- •
The formations of AlF3 and YF3 on the coating surfaces were confirmed by XPS.
- •
The etch rate depends on surface fluorination and the removal of fluoride layer.