Microstructure and high temperature oxidation resistance of nickel based alloy GH4169 irradiated by high current pulsed electron beam

详细信息    查看全文

• 作者：Peng Lv^a ; Xiao Sun^b ; Jie Cai^c ; Conglin Zhang^a ; Xinlin Liu^d ; Qingfeng Guan^a ; ^{guanqf@mail.ujs.edu.cn}
• 关键词：High current pulsed electron beam (HCPEB) ; Nickel-based superalloy GH4169 ; Microstructure ; High temperature oxidation resistance
• 刊名：Surface and Coatings Technology
• 出版年：2017
• 出版时间：15 January 2017
• 年：2017
• 卷：309
• 期：Complete
• 页码：401-409
• 全文大小：2379 K
• 卷排序：309

文摘

HCPEB irradiation enhanced the oxidation resistance of nickel based alloy GH4169. HCPEB irradiation induced the formation of compact remelted nanolayer (3–8 μm). HCPEB irradiation led γ′ phase solved into the matrix and formed supersaturated solid solution. HCPEB irradiation improved the high temperature oxidation resistance more than 20%.