Processing study of SU-8 pillar profiles with high aspect ratio by electron-beam lithography
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- 作者：Yaqi Ma ; Yifan Xia ; Jianpeng Liu ; Sichao Zhang ; Jinhai Shao ; Bing-Rui Lu ; Yifang Chen ; yifangchen@fudan.edu.cn" class="auth_mail" title="E-mail the corresponding author
- 关键词：SU-8 pillar ; Profile control ; Electron beam lithography ; High aspect ratio ; Nanofabrication
- 刊名：Microelectronic Engineering
- 出版年：2016
- 出版时间：5 January 2016
- 年：2016
- 卷：149
- 期：Complete
- 页码：141-144
- 全文大小：695 K
文摘
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E-beam lithography of SU-8 pillars for 5 μm and 10 μm height has been studied.
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SU-8 pillars with different profiles have been fabricated and discussed.
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Processing study using proximity effect for profile controlling have been studied.
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Optical characterization of SU-8 pillars have been carried out.