Preparation and electron field emission of carbon nanowall by Cat-CVD

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• 作者：Takashi Itoh ; Seiji Shimabukuro ; Shigeo Kawamura and Shuichi Nonomura
• 关键词：Carbon nanowall ; Nanostructured carbon ; Catalytic CVD ; Electron field emission
• 刊名：Thin Solid Films
• 出版年：2006
• 出版时间：20 April 2006
• 年：2006
• 卷：501
• 期：1-2
• 页码：314-317
• 全文大小：253 K

文摘

Carbon nanowall (CNW) films have been prepared by catalytic chemical vapor deposition using only CH₄ gas. In the SEM images of the samples prepared at a substrate heating temperature, T_s, of 500 °C, the wall structures on the substrates were observed. In those prepared at T_s of 400 °C, however, the wall structure was not observed. The electron field emission from the CNW films was observed at small electric field. The wall width and height increased when the Raman intensity ratio, I_D/I_G, decreased. Then, the threshold electric field decreased. The smallest threshold electric field was 2.6 V/μm in this work.