In situ Ni-doping during cathodic electrodeposition of hematite for excellent photoelectrochemical performance of nanostructured nickel oxide-hematite p-n junction photoanode
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- 作者：Yi Wen Phuana ; phuan.yi.wen@monash.edu" class="auth_mail" title="E-mail the corresponding author ; Elyas Ibrahima ; meibr2@student.monash.edu" class="auth_mail" title="E-mail the corresponding author ; Meng Nan Chong ; Dr.a ; b ; Chong.Meng.Nan@monash.edu" class="auth_mail" title="E-mail the corresponding author (Associate Professor) ; Tao Zhua ; zhu.tao@monash.edu" class="auth_mail" title="E-mail the corresponding author ; Byeong-Kyu Leec ; bklee@ulsan.ac.kr" class="auth_mail" title="E-mail the corresponding author ; Joey D. Ocond ; jdocon@up.edu.ph" class="auth_mail" title="E-mail the corresponding author ; Eng Seng Chana ; chan.eng.seng@monash.edu" class="auth_mail" title="E-mail the corresponding author
- 关键词：Electrodeposition ; Hematite ; Photoelectrochemical ; p-n Junction ; Solar energy conversion ; Water splitting
- 刊名：Applied Surface Science
- 出版年：2017
- 出版时间：15 January 2017
- 年：2017
- 卷：392
- 期：Complete
- 页码：144-152
- 全文大小：3049 K
文摘
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NiO-hematite p-n junction photoanodes were fabricated via an in situ Ni-doping.
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The fundamental mechanism of Ni2+ ions involved was elucidated.
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The optimum Ni dopant was 25 M% for the highest photocurrent density.
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It exhibited an excellent photoelectrochemical performance of 7-folds enhancement.
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