Resolution enhancement using pulse width modulation in digital micromirror device-based point-array scanning pattern exposure
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- 作者：Hung-Fei Kuo ; Yi-Jun Huang
- 关键词：Maskless lithography ; Digital micromirror device (DMD) ; Point-array scanning ; Pulse width modulation (PWM) ; Field tracing
- 刊名：Optics and Lasers in Engineering
- 出版年：2016
- 出版时间：April 2016
- 年：2016
- 卷：79
- 期：Complete
- 页码：55-60
- 全文大小：3958 K
文摘
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The objective of this study is to improve the linewidth resolution using the PWM technique.
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Field tracing technique is used for the design of point-array projection lithography.
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The dynamics of point-array exposure is modeled under PWM exposure mode.
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Improved photoresist line widths under PWM exposure are demonstrated.