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Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature
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文摘
In this work we report the role of thickness on electrochromic behavior of nickel oxide (NiO) films deposited by e-beam evaporation at room temperature on ITO-coated glass. The structure and morphology of films with thicknesses between 100 and 500 nm were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 0.5 M LiClO4-PC electrolyte. The NiO exhibits an anodic coloration, reaching for the thickest film a transmittance modulation of 66% between colored and bleached state, at 630 nm, with a color efficiency of 55 cm2 C鈭?. Very fast switch between states was obtained, where coloration and bleaching times are 3.6 s cm鈭? and 1.4 s cm鈭?, respectively.

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