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Toward predicting the mercury removal by chlorine on the ZnO surface
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文摘
The density functional theory with the generalized gradient approximation has been used to determine the binding mechanism of Cl2, HCl and Hg species on the ZnO() surface, and the Hg0 oxidation mechanism by Cl2 (or HCl) on the ZnO surface. Cl2 and HCl are dissociatively adsorbed on the surface, and Cl atom bonds to two adjacent Zn atoms. Binding energy of Hg0 is showing a physisorption mechanism, while HgCl2 is strongly adsorbed on the surface in the molecularly mode, which indicates that the oxidation of Hg0 is necessary for its removal from flue gas. HgCl is not an indispensable intermediate during the Hg0 oxidation to form HgCl2. Three Hg0 oxidation mechanisms have been investigated, and the HgCl2 is easy to be formed via both the Eley-Rideal and Langmuir鈭扝inshelwood mechanisms, while Mars鈭扢aessen mechanism is unfavorable since high activation energy is needed for Hg0 reacting with the lattice oxygen of ZnO. The adsorbed H atoms by HCl dissociation inhibit the formation of HgCl2, and Cl2 is the primary species being responsible for the Hg0 oxidation on the ZnO surface.

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