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Nanosecond pulse laser scribing using Bessel beam for single shot removal of transparent conductive oxide thin film
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文摘
Bessel beam was used to improve ns laser scribing of TCO thin film. Few microns-wide scribes were fabricated on the film with electrical isolation. Robustness of sample positioning in axial direction was improved dramatically. Use of Bessel beam helps avoiding plasma shielding at the film surface. Single shot removal by film side irradiation was achieved unlike Gaussian beam.

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