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Characterization and FDTD simulation analysis on light trapping structures of amorphous silicon thin films by laser irradiation
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文摘

The light trapping structures of α-Si thin film are formed by pulsed laser irradiation.

Different reflection spectra corresponding to h/D are obtained by FDTD simulation.

Reflection spectra with different structure are measured by UV–visible spectroscopy.

The morphology characterization verifies light-trapping modeling in the simulation.

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