Ozonation and UV_{254 nm} radiation for the removal of microorganisms and antibiotic resistance genes from urban wastewater

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• 作者：José ; M. Sousa^a ; ¹ ; Gonç ; alo Macedo^b ; ¹ ; Marta Pedrosa^c ; ¹ ; Cristina Becerra-Castro^a ; ^b ; Sé ; rgio Castro-Silva^d ; M. Fernando R. Pereira^c ; Adriá ; n M.T. Silva^c ; Olga C. Nunes^a ; ^{opnunes@fe.up.pt} ; Cé ; lia M. Manaia^b
• 关键词：Synthetic wastewater ; Urban wastewater ; Microbial inactivation ; Microbial regrowth ; Antibiotic resistance genes
• 刊名：Journal of Hazardous Materials
• 出版年：2017
• 出版时间：5 February 2017
• 年：2017
• 卷：323
• 期：part_PA
• 页码：434-441
• 全文大小：723 K
• 卷排序：323

文摘

Ozonation and UV can remove up to 4 log units of microorganisms from wastewater. UV radiation and mainly ozonation can remove some ARGs to values close to LOQ. Re-growth to pre-treatment levels may occur after ozonation or UV radiation. Enterococci is less prone to re-grow than enterobacteria, heterotrophs or fungi. Ozonation and UV radiation may lead to an increase of ARG prevalence.