Non-Porod scattering and non-integer scaling of resistance in rough films

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• 作者：Arunkumar Bupathy^a ; Rupesh Verma^a ; Varsha Banerjee^a ; Sanjay Puri^b ; ^{purijnu@gmail.com}
• 关键词：Anomalous diffusion ; Rough films ; Resistance laws
• 刊名：Journal of Physics and Chemistry of Solids
• 出版年：2017
• 出版时间：April 2017
• 年：2017
• 卷：103
• 期：Complete
• 页码：33-39
• 全文大小：1101 K
• 卷排序：103

文摘

In many physical systems, films are rough due to the stochastic behavior of depositing particles. They are characterized by non-Porod   power law decays in the structure factor S(k)S(k). Theoretical studies predict anomalous diffusion in such morphologies, with important implications for diffusivity, conductivity, etc. We use the non-Porod decay to accurately determine the fractal properties of two prototypical nanoparticle films: (i) Palladium (Pd) and (ii) Cu2O. Using scaling arguments, we find that the resistance of rough films of lateral size L obeys a non-integer   power law R∼L−ζR∼L−ζ, in contrast to integer power laws for compact structures. The exponent ζ is anisotropic. We confirm our predictions by re-analyzing experimental data from Cu2O nano-particle films. Our results are valuable for understanding recent experiments that report anisotropic electrical properties in (rough) thin films.