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Transfer printing of fully formed thin-film microscale GalnP/GaAs solar cell on silicon with interfacial material of HfO2
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文摘
Micro-scale double-junction GalnP/GaAs solar cell has been transfer printed onto Si substrate for the first time to mimic mechanically- stacked device. The 20nm-thick HfO2 film has been used as optically-transparent and electrically-insulating interface material. NIR optical image, cross sectional view SEM image and spatially-resolved reflectance confirm the bonding of high uniformity and quality.

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