The influence of tip performance on scanning probe lithography

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• 作者：Zhou ; Hualan ; Li ; Zhuang ; Wu ; Aiguo ; Zheng ; Jianping ; Zhang ; Jian ; Wu ; Shifa
• 关键词：07.79 ; 85.40.H ; 07.10 ; 61.46 ; Scanning probe microscopy ; Lithography ; Nanotechnology ; Nanostructure
• 刊名：Applied Surface Science
• 出版年：2004
• 出版时间：January 15, 2004
• 年：2004
• 卷：221
• 期：1-4
• 页码：402-407
• 全文大小：314 K

文摘

Scanning probe lithography (SPL), employing the tip of an atomic force microscope to mechanically pattern various materials in nanoscale region has provided a simple but significant method for making nanostructures. We use this technique for the lithography of several kinds of substrate surfaces. The tip performance has been found to be a crucial factor in the lithographic process. Four types of cantilevers are employed in nanolithography, including standard silicon nitride (DNP), tapping mode™ etched silicon (TESP(W)), uncoated silicon cantilever (NSC21/50) and conductive platinum/iridium-coated probe. Results demonstrate that tips with smaller spring constants can not be used for physically scribing and nanomanipulating in our experiment. The possible mechanism of our experiment is discussed.