Magnetron sputtering deposition Ti–B–C–N films by Ti/B₄C compound target

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• 作者：Guangze Tang ; Xinxin Ma ; Mingren Sun ; Shuyan Xu
• 关键词：Ti– ; B– ; C– ; N films ; X-ray ; Hardness ; Scratch test ; Magnetron sputtering deposition
• 刊名：Surface and Coatings Technology
• 出版年：2009
• 出版时间：25 January 2009
• 年：2009
• 卷：203
• 期：9
• 页码：1288-1291
• 全文大小：705 K

文摘

Ti–B–C–N films were deposited by unbalanced DC magnetron sputtering with Ti/B₄C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film composition, phase structure, hardness, modulus and scratch resistance. The results showed that the composition of the Ti–B–C–N films can be adjusted by changing deposition parameters, such as gas ratio of N₂ to Ar and the magnetron coil current. The main crystal phase in the films was TiB₂. The proportion of crystalline TiB₂ decreased with the increasing of N₂ partial pressure and reached a maximum value at 300 mA magnetic coil current, when the coil current changed from 200 mA to 500 mA. The films containing more TiB₂ proportion showed higher hardness and modulus. The scratch resistance of the films increased with the films hardness.