High-surface-area ceria prepared by ALD on Al2O3 support
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- 作者：Tzia Ming Onna ; tonn@seas.upenn.edu" class="auth_mail" title="E-mail the corresponding author ; Shuyi Zhangb ; c ; Lisandra Arroyo-Ramireza ; Ye Xiaa ; Cong Wanga ; Xiaoqing Panb ; d ; George W. Grahamb ; c ; Raymond J. Gortea
- 关键词：Ceria ; Thermal stability ; Atomic layer deposition ; Palladium ; Water gas shift reaction ; Redox properties
- 刊名：Applied Catalysis B: Environmental
- 出版年：2017
- 出版时间：February 2017
- 年：2017
- 卷：201
- 期：Complete
- 页码：430-437
- 全文大小：1717 K
文摘
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Active high-surface-area ceria support was prepared by Atomic Layer Deposition (ALD) of CeO2 on porous Al2O3.
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TEM shows CeO2 added by ALD forms a conformal film over the Al2O3.
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Pd-impregnated on the ALD-modified support exhibits higher WGS and CO-oxidation rates due to the improved Pd-ceria contact.
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The ALD-prepared catalyst shows improved thermal stability compared to bulk CeO2.