Highly sensitive optical interferometric technique reveals stress-dependent instantaneous nanometric growth fluctuations of Chinese chive leaf under heavy metal stress

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• 作者：Kokge Thilini Kanchana Muthumali DeSilva^a ; ^b ; Uma Maheswari Rajagopalan^c ; Hirofumi Kadono^a ; ^{kadono@mail.saitama-u.ac.jp}
• 关键词：ANSD ; Average normalized standard deviation ; CAT ; Catalase ; CCD ; Charge-coupled device ; H2O2 ; Hydrogen peroxide ; ICP-AES ; Inductively coupled plasma- atomic emission spectrometry ; NIF ; Nanometric intrinsic fluctuation ; POD ; Peroxidase ; RER ; Relative elongation rate ; ROS ; Reactive oxygen species ; SD ; Standard deviation ; SIT ; Statistical interferometry technique ; SOD ; Super oxide dismutase
• 刊名：Ecotoxicology and Environmental Safety
• 出版年：2017
• 出版时间：March 2017
• 年：2017
• 卷：137
• 期：Complete
• 页码：86-93
• 全文大小：654 K
• 卷排序：137

文摘

Nanometric Intrinsic Fluctuation (NIF) in plants is sensitive to heavy metal exposure. NIF showed reductions under Cd exposure. Increment in NIF was observed under Zn exposure. Statistical Interferometry Technique (SIT) is suitable for fast, in-situ monitoring of Cd and Zn stress in plants.