Ultra smooth NiO thin films on flexible plastic (PET) substrate at room temperature by RF magnetron sputtering and effect of oxygen partial pressure on their properties

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• 作者：S. N ; y ; S. Goswami ; K.K. Chattopadhyay
• 关键词：NiO ; Transparent conducting oxide ; RF sputtering ; PET ; HRTEM
• 刊名：Applied Surface Science
• 出版年：2010
• 出版时间：1 March 2010
• 年：2010
• 卷：256
• 期：10
• 页码：3142-3147
• 全文大小：613 K

文摘

Transparent p-type nickel oxide thin films were grown on polyethylene terephthalate (PET) and glass substrates by RF magnetron sputtering technique in argon + oxygen atmosphere with different oxygen partial pressures at room temperature. The morphology of the NiO thin films grown on PET and glass substrates was studied by atomic force microscope. The rms surface roughnesses of the films were in the range 0.63–0.65 nm. These ultra smooth nanocrystalline NiO thin films are useful for many applications. High resolution transmission electron microscopic studies revealed that the grains of NiO films on the highly flexible PET substrate were purely crystalline and spherical in shape with diameters 8–10 nm. XRD analysis also supported these results. NiO films grown on the PET substrates were found to have better crystalline quality with fewer defects than those on the glass substrates. The sheet resistances of the NiO films deposited on PET and glass substrates were not much different; having values 5.1 and 5.3 kΩ/%a1; and decreased to 3.05, 3.1 kΩ/%a1; respectively with increasing oxygen partial pressure. The thicknesses of the films on both substrates were 700 nm. It was also noted that further increase in oxygen partial pressure caused increase in resistivity due to formation of defects in NiO.