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Experimental determination of dependence of vertical growth rate on surface supersaturation in GaAs(001) microchannel epitaxy and growth optimization
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文摘

The dependence of vertical growth rate on surface supersaturation in GaAs(001) microchannel epitaxy (MCE) is studied.

The surface supersaturation is estimated by the fitting of a spiral step on the grown layer.

The screw-like steps at stacking faults (SFs) are also employed to estimate the surface supersaturation.

2D nucleation at SFs was found to act as a strong step source.

An MCE layer with a large aspect ratio can be reproducibly obtained using appropriately controlled surface supersaturation.

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