Shear strengths of FCC-FCC cube-on-cube interfaces

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• 作者：Xuying Liu ; Rui Hao ; Shimin Mao ; Shen J. Dillon ; ^{sdillon@illinois.edu}
• 关键词：Shear strength ; Interfaces ; Multilayers ; In situ ; Transmission electron microscopy
• 刊名：Scripta Materialia
• 出版年：2017
• 出版时间：15 March 2017
• 年：2017
• 卷：130
• 期：Complete
• 页码：178-181
• 全文大小：647 K
• 卷排序：130

文摘

This work employs in-situ transmission electron microscopy based nanopillar compression of physical vapor deposited multilayers to measure the interfacial shear strengths of model Ag-Pd, Ag-Au, Ag-Ni, Ag-Cu, and Cu-Ni (111) oriented cube-on-cube interfaces. The experimental trends are primarily rationalized by considering the coherency regimes. Coherent interfaces shear via slip transmission across them. Pillars containing semi-coherent interfaces with < 5% atomic misfit deform rather homogeneously. Interfaces exhibiting atomic misfit > 5% shear locally and their interfacial shear strength decreases with increasing misfit.