Use of XPS to clarify the Hall coefficient sign variation in thin niobium layers buried in silicon

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• 作者：Iraida N. Demchenko^a ; ^{demch@ifpan.edu.pl} ; Wojciech Lisowski^b ; Yevgen Syryanyy^a ; Yevgen Melikhov^a ; ^c ; Iryna Zaytseva^a ; Pavlo Konstantynov^a ; Maryna Chernyshova^d ; Marta Z. Cieplak^a
• 关键词：Hall coefficient ; Superconductivity ; HR XPS ; Si/Nb/Si ; NbSi
• 刊名：Applied Surface Science
• 出版年：2017
• 出版时间：31 March 2017
• 年：2017
• 卷：399
• 期：Complete
• 页码：32-40
• 全文大小：3692 K
• 卷排序：399

文摘

HR XPS spectra of Nb 3d, Si 2p, O 1s were probed for Si/Nb/Si trilayers prepared by magnetron sputtering to clarify the Hall coefficient variation as a function of Nb layer thickness. Strong boundary scattering, enhanced by the presence of silicon ions in the layer close to the interface/s is a main factor leading to sign change of the Hall coefficient. Theoretical concentration/depth profile as a function of sputtering determined by SESSA after optimization of the model system gives good agreement with experiment.