用户名: 密码: 验证码:
Study on the preparation of boron-rich film by magnetron sputtering in oxygen atmosphere
详细信息    查看全文
文摘

Boron (10B) oxide films were successfully grown using RF magnetron sputtering.

Effects of oxygen partial pressure on the property of the films were studied.

Substrates were covered with B-rich film and film surface was covered with B2O3.

The growth mechanism of films in oxygen atmosphere was analyzed using XPS.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700