Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application
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- 作者：G. Ulliac ; V. Calero ; A. Ndao ; F.I. Baida ; M.-P. Bernal ; maria-pilar.bernal@univ-fcomte.fr" class="auth_mail" title="E-mail the corresponding author
- 关键词：Thin film lithium niobate ; Argon plasma etching ; Ridge waveguides
- 刊名：Optical Materials
- 出版年：2016
- 出版时间：March 2016
- 年：2016
- 卷：53
- 期：Complete
- 页码：1-5
- 全文大小：1187 K
文摘
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Ridge waveguides on 700 nm thickness lithium niobate have been fabricated.
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Argon plasma etching on ICP–RIE has been used.
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Final cleaning treatment allows to remove redeposited material with a result of smooth side walls.
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Single mode propagation with 5 dB/cm of overall optical losses has been experimentally measured.