Effect of N₂ gas injection parameters on structure and properties of TiN thin films prepared by reactive gas pulse sputtering

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• 作者：Jijun Yang ; ^{jjyang@scu.edu.cn} ; Mingjin Peng ; Jiali Liao ; Yuanyou Yang ; Ning Liu ; ^{nliu720@scu.edu.cn}
• 关键词：TiN film ; Reactive gas sputtering ; Structure ; Properties
• 刊名：Surface and Coatings Technology
• 出版年：2017
• 出版时间：15 February 2017
• 年：2017
• 卷：311
• 期：Complete
• 页码：391-397
• 全文大小：1171 K
• 卷排序：311

文摘

TiN films with the hybrid architecture of compositionally graded and multilayered structures were confirmed. Effect of N2 injection parameters on microstructure, mechanical and electrical properties of RGP-TiN films was studied. The relationship between the deposition parameters, structure and properties of RGP-TiN films was clarified.