XAS, XRD, AFM and Raman studies of nickel tungstate electrochromic thin films

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• 作者：Kuzmin ; A. ; Purans ; J. ; Kalendarev ; R. ; Pailharey ; D. ; Mathey ; Y.
• 关键词：Nickel tungstate thin films ; X-ray absorption spectroscopy ; X-ray diffraction ; Raman spectroscopy ; Atomic force microscopy
• 刊名：Electrochimica Acta
• 出版年：2001
• 出版时间：April 2, 2001
• 年：2001
• 卷：46
• 期：13-14
• 页码：2233-2236
• 全文大小：155 K

文摘

Systematic studies of nanocrystalline nickel tungstate, NiWO₄, thin films were performed by several experimental techniques such as Ni K- and W L_1,3-edges X-ray absorption spectroscopy, X-ray diffraction, Raman spectroscopy, atomic force microscopy and cyclic voltammetry measurements. We found that the NiWO₄ thin films exhibit electrochromic properties similar to that of amorphous tungsten trioxide films, but show better structural stability upon multiple colouring/bleaching cycling. It was observed that a nanocrystallinity of the thin films results in strong modifications of the NiO and WO interactions, which affect both local atomic and vibrational structures.