Vertically Aligned Peptide Nanostructures Using Plasma-Enhanced Chemical Vapor Deposition
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- 作者：Milana C. Vasudev ; Hilmar Koerner ; Kristi M. Singh ; Benjamin P. Partlow ; David L. Kaplan ; Ehud Gazit ; Timothy J. Bunning ; Rajesh R. Naik
- 刊名：Biomacromolecules
- 出版年：2014
- 出版时间：February 10, 2014
- 年：2014
- 卷：15
- 期：2
- 页码：533-540
- 全文大小：632K
- ISSN：1526-4602
文摘
In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited d-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.