Core−Shell Chromium Silicide−Silicon Nanopillars: A Contact Material for Future Nanosystems

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• 作者：Mu-Tung Chang ; Chih-Yen Chen ; Li-Jen Chou ; Lih-Juann Chen
• 刊名：ACS Nano
• 出版年：2009
• 出版时间：November 24, 2009
• 年：2009
• 卷：3
• 期：11
• 页码：3776-3780
• 全文大小：311K
• 年卷期：0
• ISSN：1936-086X

文摘

Chromium silicide nanostructures are fabricated inside silicon nanopillars grown by the vapor−liquid−solid mechanism. The remarkable field-emission behavior of these nanostructures results from extensive improvement of carrier transport due to the reduced energy barrier between the metal and semiconductor layers. The results warrant consideration of chromium silicide as a potentially important contact material in future nanosystems.