Photopatternable Interfaces for Block Copolymer Lithography
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- 作者：Michael J. Maher ; Christopher M. Bates ; Gregory Blachut ; Matthew C. Carlson ; Jeffrey L. Self ; Dustin W. Janes ; William J. Durand ; Austin P. Lane ; Christopher J. Ellison ; C. Grant Willson
- 刊名：ACS Macro Letters
- 出版年：2014
- 出版时间：August 19, 2014
- 年：2014
- 卷：3
- 期：8
- 页码：824-828
- 全文大小：329K
- ISSN：2161-1653
文摘
Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generator (PAG), and coated to create grafted surface treatments (GSTs). These as-cast GST films are either inherently neutral or preferential (but not both) to lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-b-PTMSS). Subsequent contact printing and baking produced GSTs with submicron chemically patterned gratings. The catalytic reaction of the photoacid generated in the UV-exposed regions of the GSTs changed the interfacial interactions between the BCP and the GST in one of two ways: from neutral to preferential (鈥淣2P鈥? or preferential to neutral (鈥淧2N鈥?. When PS-b-PTMSS was thermally annealed between a chemically patterned GST and a top coat, alternating regions of perpendicular and parallel BCP lamellae were formed.