用户名: 密码: 验证码:
Low Temperature Aqueous Solution Route to Reliable p-Type Doping in ZnO with K: Growth Chemistry, Doping Mechanism, and Thermal Stability
详细信息    查看全文
文摘
In this paper, we identified how the growth environment chemistry can critically influence the type and nature of the incorporated K defect in ZnO films grown using the aqueous solution route, which explains the switching between p- and n-type conductivities under different doping or thermal annealing conditions. This was achieved by relating the growth environment to the structural, optical, and electrical characteristics of the films. The thermal behavior of these defects up to 700 掳C confirms the proposed doping mechanism. It is found that the best route to realizing p-type conductivity is through minimizing the amount of Ki and KZn鈥揔i complexes because films with high concentrations of Ki have a slow p-type recovery caused by the slow out-diffusion of Ki. The highest hole concentrations for as-grown films and those that were annealed at 700 掳C for 30 min were 2.6 脳 1016 and 3.2 脳 1017 cm鈥?, respectively. The upper limit for p-type doping using this route appears to be about mid-1017 cm鈥?. Our results show that the low temperature aqueous solution synthesis route of ZnO:K is a promising solution toward reliable p-type conductivity for future device applications.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700