Photopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist

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• 作者：Katherine L. Camera ; Jaritza G贸mez-Zayas ; Daisuke Yokoyama ; M. D. Ediger ; Christopher K. Ober
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2015
• 出版时间：October 28, 2015
• 年：2015
• 卷：7
• 期：42
• 页码：23398-23401
• 全文大小：240K
• ISSN：1944-8252

文摘

We report indomethacin as a photoresist that can be dry-deposited (as well as spin-coated), and developed in weak aqueous base. This is the first reported patterning of indomethacin as a resist material. Nanometer-scale patterns were achieved through DUV photolithography and the underlying patterning mechanism was investigated.