用户名: 密码: 验证码:
Enlarged Pore Size in Mesoporous Silica Films Templated by Pluronic F127: Use of Poloxamer Mixtures and Increased Template/SiO2 Ratios in Materials Synthesized by Evaporation-Induced Self-A
详细信息    查看全文
文摘
Although evaporation-induced self-assembly (EISA) has proven to be a convenient method for synthesizing nanoporous silica films (and particles), accessing material structures with pore sizes larger than ca. 10 nm remains experimentally inconvenient. The use of pore swelling agents (SAs), commonly used during the hydrothermal synthesis of mesoporous silicas, results in little or no pore size expansion due to evaporation or phase separation. Moreover, diblock copolymer templates can yield large pores but are quite expensive and generally require the addition of strong organic cosolvents. Here, we hypothesized that pores templated by the Pluronic triblock polymer F127 could be successfully enlarged, without phase separation, by using a chemically similar, nonvolatile, secondary Pluronic polymer (P103) as the SA. We find pore size increased up to 15 nm for a spherical pore morphology, with a phase transition to a multilamellar vesicle (MLV)-based nanostructure occurring as the P103/F127 ratio is further increased. This MLV phase produces even larger pore sizes due to the collapse of concentric silica shells upon template removal. Remarkably, F127 alone exhibits expansion of pore size (up to ca. 16 nm) as the template/silica ratio is increased. We find appearance of the MLV phase is due to geometric packing considerations, with expansion of F127 micelle size being a result of favorable intermolecular interactions driven by the large poly(ethylene oxide) content of F127. Other Pluronic polymers with this feature also exhibit variable pore size based on the template/silica ratio, enabling the synthesis of mesoporous films with 3D pore connectivity and truly variable pore size of ca. 4.5 to almost 20 nm.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700