Delivering Octadecylphosphonic Acid Self-Assembled Monolayers on a Si Wafer and Other Oxide Surfaces

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• 作者：Heng-Yong Nie ; Mary J. Walzak ; N. Stewart McIntyre
• 刊名：Journal of Physical Chemistry B
• 出版年：2006
• 出版时间：October 26, 2006
• 年：2006
• 卷：110
• 期：42
• 页码：21101 - 21108
• 全文大小：287K
• 年卷期：v.110,no.42(October 26, 2006)
• ISSN：1520-5207

文摘

We describe a simple experimental approach for delivering self-assembled monolayers (SAMs) ofoctadecylphosphonic acid (OPA) on many oxide surfaces using a nonpolar medium with a dielectric constantaround 4 (e.g., trichloroethylene). This approach readily results in the formation of full-coverage OPA SAMson a wide variety of oxide surfaces including cleaved mica, Si wafer, quartz, and aluminum. Especially, theavailability of delivering full-coverage OPA SAM on a Si wafer is unique, as no OPA SAMs at all could beformed on a Si wafer when using a polar OPA solution. The reason a nonpolar solvent is superior lies in thevery fact that the hydrophilic OPA headgroup tends to escape from the nonpolar solution and is thus enrichedat the medium-air interface. It is these OPA headgroups seeking a hydrophilic surface that make possible thewell-controlled OPA monolayer on an oxide surface.