Microchannel Wetting for Controllable Patterning and Alignment of Silver Nanowire with High Resolution

详细信息    查看全文

• 作者：Bo-Ru Yang ; Wu Cao ; Gui-Shi Liu ; Hui-Jiuan Chen ; Yong-Young Noh ; Takeo Minari ; Hsiang-Chih Hsiao ; Chia-Yu Lee ; Han-Ping D. Shieh ; Chuan Liu
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2015
• 出版时间：September 30, 2015
• 年：2015
• 卷：7
• 期：38
• 页码：21433-21441
• 全文大小：701K
• ISSN：1944-8252

文摘

Patterning and alignment of conductive nanowires are essential for good electrical isolation and high conductivity in various applications. Herein a facile bottom-up, additive technique is developed to pattern and align silver nanowires (AgNWs) by manipulating wetting of dispersions in microchannels. By forming hydrophobic/hydrophilic micropatterns down to 8 渭m with fluoropolymer (Cytop) and SiO₂, the aqueous AgNW dispersions with the optimized surface tension and viscosity self-assemble into microdroplets and then dry to form anisotropic AgNW networks. The alignment degree characterized by the full width at half-maximum (FWHM) can be well-controlled from 39.8掳 to 84.1掳 by changing the width of microchannels. A mechanism is proposed and validated by statistical analysis on AgNW alignment, and a static model is proposed to guide the patterning of general NWs. The alignment reduced well the electrical resistivity of AgNW networks by a factor of 5 because of the formation of efficient percolation path for carrier conduction.