Predictive Ratio Control for Interacting Processes

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• 作者：Kok Kiong Tan ; Arthur Tay ; Zhao Shao ; Sunan Huang ; Tong Heng Lee
• 刊名：Industrial & Engineering Chemistry Research
• 出版年：2009
• 出版时间：December 2, 2009
• 年：2009
• 卷：48
• 期：23
• 页码：10515-10521
• 全文大小：243K
• 年卷期：v.48,no.23(December 2, 2009)
• ISSN：1520-5045

文摘

In this paper, a predictive-PID ratio control scheme is developed for multivariable processes. The Generalized predictive control based PID configuration is incorporated into various conventional ratio control schemes. Conventional parallel and series ratio control cannot satisfy the stringent requirements. The proposed method is applied to the wafer temperature uniformity control in the lithography. Both simulation and experimental results show the effectiveness of the proposed predictive ratio control method.