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Concentration-Induced Wetting Transition in Water鈥揟etrahydrofuran鈥揑sobutane Systems
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  • 作者:Lars Boewer ; Michael Paulus ; Felix Lehmku虉hler ; Metin Tolan
  • 刊名:Journal of Physical Chemistry C
  • 出版年:2011
  • 出版时间:September 22, 2011
  • 年:2011
  • 卷:115
  • 期:37
  • 页码:18235-18238
  • 全文大小:789K
  • 年卷期:v.115,no.37(September 22, 2011)
  • ISSN:1932-7455
文摘
The pressure-dependent wetting of isobutane at the aqueous tetrahydrofuran (THF) solution鈥搃sobutane interface was studied by means of X-ray reflectivity measurements. Using pure water and mixtures at low THF concentrations, a completely wetting isobutane layer is adsorbed onto the substrate. The pressure-dependent layer thickness can be described by a simple adsorption isotherm. In contrast, the formation of thick layers with low electron density is observed at high THF concentrations. The film growth shows an unpredictable behavior. This finding can be explained by the formation of partially wetting isobutane droplets on the water/THF substrate caused by a decrease of the liquid鈥檚 surface tension with increasing THF concentration.

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