Thin, silicon-doped nanocrystalline
-Fe
2O
3 films have been deposited on F-doped SnO
2 substrates by ultrasonic spray pyrolysis
and chemical vapor deposition at atmospheric pressure. The photocatalytic activity of these films with regard to photoelectrochemical water oxidation was measured at pH 13.6 under simulated AM 1.5 global sunlight. The photoanodes prepared by USP
and APCVD gave 1.17
and 1.45 mA/cm
2, respectively, at 1.23 V vs RHE. The morphology of the
-Fe
2O
3 was strongly influenced by the silicon doping, decreasing the feature size of the mesoscopic film. The silicon-doped
-Fe
2O
3 nano-leaflets show a preferred orientation with the (001) basal plane normal to the substrate. The best performing photoanode would yield a solar-to-chemical conversion efficiency of 2.1% in a t
andem device using two dye-sensitized solar cells in series.