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Efficient Photocatalytic Degradation of Phenol over Co3O4/BiVO4 Composite under Visible Light Irradiation
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文摘
Co3O4/BiVO4 composite photocatalyst with a p-n heterojunction semiconductor structure has been synthesizedby the impregnation method. The physical and photophysical properties of the composite photocatalyst havebeen characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), transimission electronmicroscopy (TEM), BET surface area, and UV-visible diffuse reflectance spectra. Co is present as p-typeCo3O4 and disperses on the surface of n-type BiVO4 to constitute a heterojunction composite. The photocatalystexhibits enhanced photocatalytic activity for phenol degradation under visible light irradiation. The highestefficiency is observed when calcined at 300 C with 0.8 wt % cobalt content. On the basis of the calculatedenergy band positions and PL spectra, the mechanism of enhanced photocatalytic activity has been discussed.

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