Vapor-Phase Metalation by Atomic Layer Deposition in a Metal鈥揙rganic Framework

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• 作者：Joseph E. Mondloch ; Wojciech Bury ; David Fairen-Jimenez ; Stephanie Kwon ; Erica J. DeMarco ; Mitchell H. Weston ; Amy A. Sarjeant ; SonBinh T. Nguyen ; Peter C. Stair ; Randall Q. Snurr ; Omar K. Farha ; Joseph T. Hupp
• 刊名：The Journal of the American Chemical Society
• 出版年：2013
• 出版时间：July 17, 2013
• 年：2013
• 卷：135
• 期：28
• 页码：10294-10297
• 全文大小：321K
• 年卷期：v.135,no.28(July 17, 2013)
• ISSN：1520-5126

文摘

Metal鈥搊rganic frameworks (MOFs) have received attention for a myriad of potential applications including catalysis, gas storage, and gas separation. Coordinatively unsaturated metal ions often enable key functional behavior of these materials. Most commonly, MOFs have been metalated from the condensed phase (i.e., from solution). Here we introduce a new synthetic strategy capable of metallating MOFs from the gas phase: atomic layer deposition (ALD). Key to enabling metalation by ALD In MOFs (AIM) was the synthesis of NU-1000, a new, thermally stable, Zr-based MOF with spatially oriented 鈭扥H groups and large 1D mesopores and apertures.