The solid-state properties and FET electrical behavior of several series of
gifchars/alpha.
gif" BORDER=0>,
gifchars/omega.
gif" BORDER=0 >- and
gifchars/beta2.
gif" BORDER=0 ALIGN="middle">,
gifchars/beta2.
gif" BORDER=0 ALIGN="middle">'-fluorocarbon- and alkyl-substituted and unsubstituted oligothiophenes nTs (
n = 2-6) are compared andcontrasted. The thin films were grown by slow vacuum deposition over a range of substrate temperaturesand/or by casting from solution and were investigated by X-ray diffraction and scanning electron microscopy.Our results indicate that vacuum deposition at 60-80
gif">C affords films with remarkably similar microstructuresdespite the extensive H
gif"> F substitution. Trends in observed
d spacing versus molecular core extensionprovide quantitative information on molecular orientation. Field-effect transistor measurements performedfor all systems and having the same device structure, components, and fabrication conditions demonstratethat all nTs functionalized with fluorocarbon chains at the thiophene termini are n-type semiconductors, incontrast to the p-type activity of the remaining systems. One of these systems,
gifchars/alpha.
gif" BORDER=0>,
gifchars/omega.
gif" BORDER=0 >-diperfluorohexyl-4T,exhibits a mobility of 0.22 cm
2/(V s) and an
Ion:
Ioff ratio of 10
6, one of the highest so far reported for ann-type organic semiconductor. The effect of substitution re
giochemistry on FET majority charge carrierwas additionally studied, in the case of a 6T core, by shifting the fluorocarbon substituents from the terminalto the central thiophene units. Finally, we propose a simple theoretical model for electrode/organic interfacialcarrier injection. The results suggest why modest substituent-induced c
hanges in the injection barrier canproduce working n
-type materials.