文摘
Monolithic and patterned aminopropyltriethoxysilane (APTES) layers are used to create n-doped graphene, graphene p鈥搉 junctions, and FET devices containing p鈥搉 junctions in the device channel through transfer of CVD graphene onto APTES coated substrates. APTES doping is shown to not result in introduction of defects. I鈥?i>V measurements of FET devices containing patterned APTES layers show it is possible to control the position of the two current minima (two Dirac points) in the ambipolar p鈥搉 junction.