In Vacuo Porphyrin Metalation on Ag(111) via Chemical Vapor Deposition of Ru3(CO)12: Mechanistic Insights

详细信息    查看全文

• 作者：Anthoula C. Papageorgiou ; Katharina Diller ; Sybille Fischer ; Francesco Allegretti ; Florian Klappenberger ; Seung Cheol Oh ; Özge Sağlam ; Joachim Reichert ; Alissa Wiengarten ; Knud Seufert ; Willi Auwärter ; Johannes V. Barth
• 刊名：Journal of Physical Chemistry C
• 出版年：2016
• 出版时间：April 28, 2016
• 年：2016
• 卷：120
• 期：16
• 页码：8751-8758
• 全文大小：582K
• 年卷期：0
• ISSN：1932-7455

文摘

Porphyrin molecules offer a very stable molecular environment for the incorporation of numerous metal ions inside their cavity, which enables a plethora of applications. The fabrication and characterization of surface confined metal–organic architectures by employing porphyrins are of particular interest. Here, we report on a comprehensive study of chemical vapor deposition (CVD) of triruthenium dodecacarbonyl as metal precursor for the on-surface metalation of different porphyrin species with Ru under ultrahigh vacuum conditions. By employing synchrotron radiation X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure (NEXAFS), and scanning tunneling microscopy (STM), we investigated the metalation process and particularly the role of the support: the close packed Ag(111) surface. It was found that the surface is active in the metalation process under the employed conditions: it decomposes the metal precursor and delivers metal centers to the porphyrin macrocycles. The generality of the metalation process is illustrated for tetraphenylporphyrin, its high temperature derivatives, and porphine.